Published May 23, 2023
| Version v1
Poster
Open
Fabrication of local areas of high aspect ratio silicon structures using metal-assisted chemical etching - MACE
- 1. Fraunhofer Institute for Electronic Nano Systems ENAS
- 2. Fraunhofer Institute for Electronic Nano Systems ENAS, Center for Microtechnologies, University of Technology Chemnitz
Description
Poster presented at the IEEE IITC/MAM 2023 conference in Dresden Germany.
Files
2023-05 IITC MAM - MACE.pdf
Files
(5.4 MB)
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