IR SPECTRA OF THIN FILMS PRODUCED BY THE ION-PLASMA METHOD

Thin films play an important role in modern technologies. They are successfully used, especially in the rapidly developing fields of electronic technology and light engineering, in the construction industry, including integrated microcircuit technologies; as anti-corrosion, decorative, filtering and radiation redistributing coatings.

We have successfully grown manganese silicide films using an ion plasma method under high vacuum conditions using a magnetron sputtering device. Thin manganese silicide films (Mn₄Si₇/glass and SiO₂/Si) produced by the "ion-plasma" method were taken as the research object.

The thickness of the thin films and the mean noise limits and standard deviation were measured on an IRTracer-100 spectrophotometer.