Multiple magneto-ionic regimes in Ta/Co20Fe60B20/HfO2
Creators
- 1. Centre de Nanosciences et de Nanotechnologies, CNRS, Universite Paris-Saclay, 91120 Palaiseau, France
- 2. Spin-Ion technologies, C2N, 10 Boulevard Thomas Gobert, 91120 Palaiseau, France
- 3. Singulus Technologies AG, Hanauer Landstrasse 103, 63796 Kahl am Main, Germany
- 4. Istituto Nazionale di Ricerca Metrologica, Strada delle Cacce 91, 10135 Torino, Italy
- 5. Laboratoire des Sciences des Procedes et des Materiaux, CNRS-UPR 3407, Universite Paris 13, Sorbonne Paris Cite, 93430 Villetaneuse, France
- 6. Central Research Institute of Electric Power Industry, Yokosuka,Kanagawa 240-0196, Japan
- 7. Center for Superconductivity, Spintronics and Surface Science, Physics and Chemistry Department, Technical University of Cluj-Napoca, Cluj-Napoca RO-400114, Romania
- 8. Centre de Nanosciences et de Nanotechnologies, CNRS, Universite Paris-Saclay, 91120 Palaiseau, France and Spin-Ion technologies, C2N, 10 Boulevard Thomas Gobert, 91120 Palaiseau, France
Description
In Ta/(Co,Fe)B/HfO2 stacks, a gate voltage drives, in a nonvolatile way, the system from an underoxidized state exhibiting in-plane anisotropy (IPA) to an optimum oxidation level resulting in perpendicular anisotropy (PMA) and further into an overoxidized state with IPA. The IPA→PMAregime is found to be significantly faster than the PMA→IPA regime, whereas only the latter shows full reversibility under the same gate voltages. The effective damping parameter also shows a marked dependence with gate voltage in the IPA→PMA regime, going from 0.029 to 0.012, and only a modest increase to 0.014 in the PMA→IPA regime. The existence of two magnetoionic regimes has been linked to a difference in the chemical environment of the anchoring points of oxygen species added to underoxidized or overoxidized layers. Our results show that multiple magnetoionic regimes can exist in a single device and that their characterization is of great importance for the design of high-performance spintronics devices.
Files
Pachat Physical Review Applied.pdf
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