Published September 2, 2017 | Version v1
Journal article Open

Molecular Layer Deposition from Dissolved Precursors

Authors/Creators

  • 1. FAU CTFM
  • 2. FAU DCP

Description

We present a procedure for growing thin films of an organic polyamid material based on a cyclic repetition of two consecutive, complementary, self-limiting surface reactions. The molecular compounds that react with the surface are dissolved in an organic solvent. This new method exemplifies how atomic layer deposition (ALD) and molecular layer deposition (MLD) can benefit from being transferred from the gas phase to the liquid phase, given that a broad variety of advantageous reagents are only available in dissolved form.

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Funding

European Commission
SOLACYLIN - A preparative approach to geometric effects in innovative solar cell types based on a nanocylindrical structure 647281