FABulous Project

Part of EU Open Research Repository
Published April 2024 | Version v1
Presentation Open

Advances in Modeling and Optimization for Two-Photon Lithography

Authors/Creators

  • 1. ROR icon Fraunhofer Institute for Integrated Systems and Device Technology
  • 2. ROR icon IMT Atlantique

Description

Advances in Modeling and Optimization for Two-Photon Lithography

Files

2024_VSedova_SPIE_OSD_talk.pdf

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Additional details

Funding

European Commission
FABulous - FABrication of 3D metasurfaces to enable the next generation of high efficiency optical products 101091644