Titanium-Based Thin Films Deposited by PVD Processes: A Brief Review

This article provides a brief review of titanium-based thin films deposited using physical vapor deposition (PVD) processes on various types of substrates, and also contains a topic dedicated to the deposition of these films using the cathodic cage plasma deposition (CCPD) technique. Thin films play a crucial role in a variety of industrial applications, including corrosion protection, wear resistance and biomedical applications. Titanium is a widely used material due to its excellent corrosion resistance, high hardness and biocompatibility. PVD methods stand out due to the high deposition rate, lower temperatures and treatment times compared to chemical vapor deposition (CVD) processes and have been commonly adopted to deposit titanium thin films on various types of substrates due to their ability to produce high quality coatings with good adhesion and uniformity. The fundamental principles of the cathodic cage plasma deposition PVD process and a review, over the last five years, of the main research articles in the PubMed, SciELO, ScienceDirect, Scopus and Springer Link databases, highlighting the main deposition parameters, deposition technique used, results and applications of titanium-based thin films deposited on various types of materials are covered in this article.