Dataset: Electrolyte-dependent deposition morphology on magnesium metal utilizing MeMgCl, Mg[B(hfip)4]2 and Mg(HMDS)2–2AlCl3 electrolytes
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This is a collection featuring the data generated and used within the paper: 'Electrolyte-dependent deposition morphology on magnesium metal utilizing MeMgCl, Mg[B(hfip)4]2 and Mg(HMDS)2–2AlCl3 electrolytes'. The deposition behavior of two state-of-the-art electrolytes, magnesium tetrakis(hexafluoroisopropyloxy)borate (Mg[B(hfip)~4~]~2~) in dimethoxyethane (DME) and magnesium bis(hexamethyldisilazide) with two equivalents of aluminum chloride (Mg(HMDS)~2~-2AlCl~3~) in tetrahydrofuran (THF) was investigated. Using symmetric flooded magnesium-magnesium cells with different electrolyte concentrations and current densities the deposition process was monitored optically in-situ by a video microscope. The depositions were characterized by scanning electron microscopy (SEM) and energy dispersive X-ray spectroscopy (EDX) and compared to depositions from methylmagnesium chloride (MeMgCl) in THF, known for its dendritic growth. In this work, MeMgCl showed unidirectional growth and for the harshest applied conditions, mossy depositions, but no branching dendrites as reported in previous literature. Mg[B(hfip)~4~]~2~ and Mg(HMDS)~2~-2AlCl~3~ did not show the formation of dendrites or a dendrite preform but also did not result in a desired smooth layer but in spherical depositions. For the Mg[B(hfip)~4~]~2~ electrolyte, the influence of magnesium borohydride (Mg(BH~4~)~2~) as an additive was additionally tested resulting in a more planar growth.
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20240228_adr_ll_plating_stripping_mg_paper.zip
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(11.6 GB)
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Related works
- Is supplement to
- Journal: 10.1039/D4LF00124A (DOI)
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- Accepted
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2024-08-07Article based on this data was accepted and is published by RSC Applied Interfaces