Published March 23, 2022 | Version v1
Journal article Open

Novel, High-Resolution, Subtractive Photoresist Formulations for 3D Direct Laser Writing Based on Cyclic Ketene Acetals

  • 1. Istituto Italiano di Tecnologia

Description

Research paper:

Marco Carlotti*, Omar Tricinci, Virgilio Mattoli*, Novel, High-Resolution, Subtractive Photoresist Formulations for 3D Direct Laser Writing based on Cyclic Ketene Acetals, Advanced Materials Technologies, 2101590, 2022  (In Press)

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Adv Materials Technologies - 2022 - Carlotti - Novel High‐Resolution Subtractive Photoresist Formulations for 3D Direct.pdf

Additional details

Funding

MP3 – Multi-Potent Polymer Precursor approach for novel conjugated polymers 885881
European Commission
5D NanoPrinting – Functional & Dynamic 3D Nano- MicroDevices by Direct Multi-Photon Lithography 899349
European Commission