Journal article Open Access
Novel, High-Resolution, Subtractive Photoresist Formulations for 3D Direct Laser Writing Based on Cyclic Ketene Acetals
Carlotti, Marco;
Tricinci, Omar;
Mattoli, Virgilio
Research paper:
Marco Carlotti*, Omar Tricinci, Virgilio Mattoli*, Novel, High-Resolution, Subtractive Photoresist Formulations for 3D Direct Laser Writing based on Cyclic Ketene Acetals, Advanced Materials Technologies, 2101590, 2022 (In Press)
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Indexed in
- Publication date:
- March 23, 2022
- DOI:
-
- Keyword(s):
- Two photon lithography MDO Cyclic ketene acetal Erasable resist Photobase MEMS
- Published in:
- Advanced Materials Technologies: pp. 2101590.
- Grants:
-
European Commission:
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MP3 - Multi-Potent Polymer Precursor approach for novel conjugated polymers (885881)
- 5D NanoPrinting - Functional & Dynamic 3D Nano- MicroDevices by Direct Multi-Photon Lithography (899349)
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MP3 - Multi-Potent Polymer Precursor approach for novel conjugated polymers (885881)
- Communities:
- License (for files):
- Creative Commons Attribution 4.0 International