Published March 23, 2022
| Version v1
Journal article
Open
Novel, High-Resolution, Subtractive Photoresist Formulations for 3D Direct Laser Writing Based on Cyclic Ketene Acetals
Description
Research paper:
Marco Carlotti*, Omar Tricinci, Virgilio Mattoli*, Novel, High-Resolution, Subtractive Photoresist Formulations for 3D Direct Laser Writing based on Cyclic Ketene Acetals, Advanced Materials Technologies, 2101590, 2022 (In Press)
Files
Adv Materials Technologies - 2022 - Carlotti - Novel High‐Resolution Subtractive Photoresist Formulations for 3D Direct.pdf
Files
(4.8 MB)
Name | Size | Download all |
---|---|---|
md5:c8467c6abc9673741c06e07dd1d947a4
|
4.8 MB | Preview Download |