Direct X-ray and electron-beam lithography of halogenated zeolitic imidazolate frameworks
Creators
- 1. Centre for Membrane Separations, Adsorption, Catalysis, and Spectroscopy for Sustainable Solutions (cMACS), KU Leuven, Leuven, Belgium
- 2. Research Group of Electrochemical and Surface Engineering, Department of Materials and Chemistry, Vrije Universiteit Brussel, Brussels, Belgium
- 3. Division of Molecular Imaging and Photonics, Department of Chemistry, KU Leuven, Leuven, Belgium
- 4. Catalysis Research Centre, Technical University of Munich, Garching, Germany
- 5. Institute of Inorganic Chemistry, Graz University of Technology, Graz, Austria
- 6. Institute of Physical and Theoretical Chemistry, Graz University of Technology, Graz, Austria.
- 7. 1 Centre for Membrane Separations, Adsorption, Catalysis, and Spectroscopy for Sustainable Solutions (cMACS), KU Leuven, Leuven, Belgium
Description
Metal–organic frameworks (MOFs) offer disruptive potential in micro- and optoelectronics because of the unique properties of these microporous materials. Nanoscale patterning is a fundamental step in the implementation of MOFs in miniaturized solid-state devices. Conventional MOF patterning methods suffer from low resolution and poorly defined pattern edges. Here, we demonstrate the resist-free, direct X-ray and electron-beam lithography of MOFs. This process avoids etching damage and contamination and leaves the porosity and crystallinity of the patterned MOFs intact. The resulting high-quality patterns have excellent sub-50-nm resolution, and approach the mesopore regime. The compatibility of X-ray and electron-beam lithography with existing micro- and nanofabrication processes will facilitate the integration of MOFs in miniaturized devices.
Files
Direct lithography ZIFs_MS.pdf
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Additional details
Related works
- Is previous version of
- Journal article: 10.1038/s41563-020-00827-x (DOI)