Area selective ALD of cobalt as mediated by thermally induced dehydrocoupled SAMs

Organic trihydridosilanes provide an elegant route for generating self-assembled monolayers (SAM)s by vapor phase transport on a variety of substrates. Under mild conditions, these precursors can be made to interact with a variety of clean metal and hydrogenated metalloid surfaces such as Ti, Cu, and Si to form near-zero-thickness SAMs. These SAMs can be customized with specific functionality to activate or deactivate subsequent Co deposition on the underlying substrate, leading to area specific Co deposition.