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Published March 6, 2019 | Version Author Accepted Manuscript
Journal article Open

A simple way to control the filling degree of the SiO2/Si template pores with nickel

Creators

  • 1. SSPA "Scientific-Practical Materials Research Centre of NAS of Belarus, 19, P.Brovka Str. 220072, Minsk, Republic of Belarus
  • 2. L.N. Gumilyov Eurasian National University, 2, Satpayev Str. 010008, Astana, Kazakhstan & The Institute of Nuclear Physics of Republic of Kazakhstan, 1, Ibragimov St. 050032, Astana, Kazakhstan
  • 3. L.N. Gumilyov Eurasian National University, 2, Satpayev Str. 010008, Astana, Kazakhstan & The Institute of Nuclear Physics of Republic of Kazakhstan, 1, Ibragimov St. 050032, Astana, Kazakhstan & Ural Federal University named after the First President of Russia B.N. Yeltsin, 19, Mira St. 620002, Yekaterinburg, Russia
  • 4. North Ossetian State University, 44-46, Vatutina str. 362000,Vladikavkaz, Russian Federation
  • 5. Voronezh State Technical University, 14, Moskovski ave., 394026, Voronezh, Russian Federation & Voronezh State University, 1, University square, 394006, Voronezh, Russian Federation

Description

The paper demonstrates a simple way to control the filling degree of the pores of a silicon oxide template on silicon substrate with nickel. SiO2/Si template was formed using the swift heavy ion tracks technology, which includes irradiation with high energy ions and chemical transformation of the obtained latent tracks into the pores. The preparation of SiO2(Ni)/Si nanostructures with different filling degree of pores in SiO2 with nickel was performed using the electrodeposition method by changing the duration of the process. A study and analysis of the morphology of SiO2(Ni)/Si nanostructures using scanning electron and atomic force microscopy was carried out to determine the nature of pore filling by metal.

Files

Yakimchuk et al (AAM) - Materials Today Proceedings 7 (2019) 860–865.pdf

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Additional details

Related works

Is previous version of
Journal article: 10.1016/j.matpr.2018.12.085 (DOI)

Funding

SPINMULTIFILM – Physical principles of the creation of novel SPINtronic materials on the base of MULTIlayered metal-oxide FILMs for magnetic sensors and MRAM 778308
European Commission