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Published September 4, 2023 | Version v1
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Pulsed 193 nm Excimer laser processing of 4H-SiC(0001) wafers with radiant exposure dependent "in situ" reflectivity studies for process optimization.

Authors/Creators

  • 1. CINBIO, UNiversity of Vigo, SPain

Description

Conference paper

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Additional details

Funding

European Commission
MI-SCAN - A rapid non-invasive on-chip miRNA-based Sputum Assay for early stage Lung Cancer Screening 894227