DRM-ALD-Arts — Diffusion–Reaction Model for Atomic Layer Deposition implemented by Arts

This is a MATLAB implementation of a diffusion-reaction model for simulating the conformality of atomic layer deposition in high-aspect-ratio structures.

This MATLAB script implements a diffusion-reaction model developed by Yanguas-Gil and Elam (Chem. Vap. Deposition 18, 46-52 (2012), DOI: 10.1002/cvde.201106938). The model uses the Damkoler and precursor excess number to determine the temporal evolution of surface coverage inside a high-aspect-ratio structure as a function of distance from the structure entrance. While the model is flexible in terms of structure geometry, this implementation was created in the context of rectangular trenches. The implementation was written by Dr. Karsten Arts and published by Jänis Järvilehto by request of Prof. Riikka Puurunen.

This is the first public release of the DRM-ALD-Arts code, v1.0.0.