Unifying PIC laser simulation and mask layout: a new methodology demonstrated on a mode-locked-laser design

Laser simulation and mask layout for photonic integrated circuits (PICs) typically take place in different design environments. This disconnect impairment can easily lead to laser designs that do not comply with manufacturing constraints, or errors in
translating laser parameters from simulation to layout, e.g. optical path lengths. In this paper, we present the integration of two open source software tools for the development of complex laser circuits: layout tool Nazca Design and traveling wave simulation
software PHIsim. The foundry compatible Nazca layout tool is used to build the laser circuit, which then one-on-one translates into the laser simulation model using the compact models in the foundry description. This method creates a linear design flow in
contrast to commonly used back-and-forward approaches between layout and simulation. Our solution allows designers to use the standard Nazca interface for drawing layout and subsequently simulate the laser circuit straight from the layout
netlist, hence, cutting out the need of complex auto-routing and allowing the designer to check the design rules and footprint in this preliminary phase. This not only saves design time but also leads to a better agreement between simulation and layout. The
integration is demonstrated with a mode-locked laser PIC.