Trace metal analysis in colloidal silica by ICP-MS after sample dilution and addition of HF

The method is used for the analysis of elements in colloidal silica with ICP-MS (Agilent 7700). The sample is diluted by ultrapure water to a concentration of 0,2-0,3% SiO2, and small volumes of hydrofluoric acid (HF) and nitric acid (HNO3) are added to dissolve the silica. The sample is thereafter directly analyzed by ICP-MS.