Published October 15, 2026
| Version 0.1
Report
Open
Convergence of Photopolymer Manufacturing and Semiconductor-Oriented Patterning: Resist Materials, Cure, Interfaces and Nanoimprint Replication
Authors/Creators
Description
Publication
ER-495 · Engineering Review · Version 0.1.
Author
Juan Segurola.
Organisation
3Dresyns by Resyner Technologies S.L.
© Juan Segurola. All rights reserved / Todos los derechos reservados.