Published January 17, 2024
| Version v1
Dataset
Open
Dataset for publication: Investigation of the Evolution of Bismuth Layers Deposited on Silicon by MBE
Authors/Creators
Description
First, a procedure for obtaining the well-defined Si(111)-7×7 surface reconstruction of the silicon substrate was developed. In the next step, a 0.4 nm-thick Bi seed layer was deposited and subsequently annealed to form a compact layer promoting the epitaxial growth of thicker bismuth films. Afterwards, a 30 nm-thick Bi film was deposited and further annealed. The evolution of the bismuth film structure with increasing annealing temperature is documented by the corresponding RHEED patterns.
Files
dataset.zip
Files
(3.8 MB)
| Name | Size | Download all |
|---|---|---|
|
md5:a9cdc43e582f62db266d7bf3da5a0526
|
3.8 MB | Preview Download |
Additional details
Related works
- Is supplement to
- Conference proceeding: 10.1063/5.0188562 (DOI)