Published April 8, 2026 | Version v1

VNA Tools: Material Parameters Extraction from On-Wafer CPW S-Parameter Measurements

  • 1. ROR icon Swiss Federal Institute of Metrology
  • 2. ROR icon National Physical Laboratory

Description

We present a software extension for determining material parameters from on-wafer line measurements. This work covers deembedding algorithms for four different models of coplanar waveguides. Their inverse implementation enables material characterization including uncertainty propagation. An example of line measurements from 1-65 GHz on an alumina calibration substrate is provided to demonstrate the application and its ease of use. This extension facilitates material characterization and systematic studies of uncertainty contributions in the realms of on-wafer measurements. It is freely available, allowing industry and research institutions to benefit from an accessible and efficient tool for on-wafer material parameter extraction.

Files

VnaToolsOnWaferMatParamPaper_final_nofooter.pdf

Files (753.5 kB)

Name Size Download all
md5:de1b62d344183697ef3d33addff37bc3
753.5 kB Preview Download

Additional details

Related works

Is source of
Conference paper: 10.1109/ARFTG68976.2026.11475009 (DOI)

Funding

European Association of National Metrology Institutes
On-wafer microwave metrology for future industrial applications (OnMicro) 23IND10