Light intensity reflected from PAAO containing samples (AoI 45 deg., 60 deg., two polarisations)
Authors/Creators
- 1. University of Latvia
- 2. Kaunas University of Technology
Description
The file contains raw intensity data measured in reflection mode for various material combinations: porous anodized aluminium oxide (PAAO), gold nanoparticles (Au NPs), diamond-like carbon with silver nanoparticles composite (DLC:Ag), quartz, and silicon.
List of investigated samples:
| Sample name | Sample description |
|---|---|
| AJ1 | Aluminium substrate, ~241 nm thickness PAAO (anodized in 0.3 mol/L oxalic acid at 40 V for 3 min 16 s), 60 nm diameter Au NPs (dip-coated at a speed of 1 μm/s) |
| AJ2 | Aluminium substrate, ~259 nm thickness PAAO (anodized in 0.3 mol/L oxalic acid at 40 V for 3 min 37 s), 60 nm diameter Au NPs (dip-coated at a speed of 1 μm/s) |
| AJ3 | Aluminium substrate, ~293 nm thickness PAAO (anodized in 0.3 mol/L oxalic acid at 40 V for 4 min 8 s), 60 nm diameter Au NPs (dip-coated at a speed of 1 μm/s) |
| AJ4 | Aluminium substrate, ~317 nm thickness PAAO (anodized in 0.3 mol/L oxalic acid at 40 V for 4 min 30 s), 60 nm diameter Au NPs (dip-coated at a speed of 1 μm/s) |
| AJ5 | Aluminium substrate, ~345 nm thickness PAAO (anodized in 0.3 mol/L oxalic acid at 40 V for 4 min 57 s), 60 nm diameter Au NPs (dip-coated at a speed of 1 μm/s) |
| AJ6 | Aluminium substrate, ~276 nm thickness PAAO (anodized in 0.3 mol/L oxalic acid at 40 V for 3 min 42 s), ~55 nm thickness, 20 V.% Ag concentration DLC:Ag (magnetron sputtered using silver target, 80 sccm argon gas flow, 5.4 sccm C2H2 gas flow, 405 V voltage, 0.09-0.10 A current, 7·10-3 mbar work pressure, 2 minutes 32 seconds process duration) |
| AJ7 | Aluminium substrate, ~316 nm thickness PAAO (anodized in 0.3 mol/L oxalic acid at 40 V for 4 min 25 s), ~55 nm thickness, 20 V.% Ag concentration DLC:Ag (magnetron sputtered using silver target, 80 sccm argon gas flow, 5.4 sccm C2H2 gas flow, 405 V voltage, 0.09-0.10 A current, 7·10-3 mbar work pressure, 2 minutes 32 seconds process duration) |
| AJ8 | Aluminium substrate, ~345 nm thickness PAAO (anodized in 0.3 mol/L oxalic acid at 40 V for 5 min 4 s), ~55 nm thickness, 20 V.% Ag concentration DLC:Ag (magnetron sputtered using silver target, 80 sccm argon gas flow, 5.4 sccm C2H2 gas flow, 405 V voltage, 0.09-0.10 A current, 7·10-3 mbar work pressure, 2 minutes 32 seconds process duration) |
| Q140 | Quartz substrate, ~55 nm thickness, 20 V.% Ag concentration DLC:Ag (magnetron sputtered using silver target, 80 sccm argon gas flow, 5.4 sccm C2H2 gas flow, 405 V voltage, 0.09-0.10 A current, 7·10-3 mbar work pressure, 2 minutes 32 seconds process duration) |
| Si140 | Silicon substrate, ~55 nm thickness, 20 V.% Ag concentration DLC:Ag (magnetron sputtered using silver target, 80 sccm argon gas flow, 5.4 sccm C2H2 gas flow, 405 V voltage, 0.09-0.10 A current, 7·10-3 mbar work pressure, 2 minutes 32 seconds process duration) |
The file also contains data for lamp and dark spectra. Images are for illustrative purposes and contain measured sample intensity minus dark intensity.
The spectra were collected by a custom-made computer-controlled motorized goniometer set-up with an incandescent lamp light source and an AvaSpec-2048 (Avantes) spectrometer covering a wavelength range of 360–860 nm with 1.2 nm resolution.
Notations inside the file: AoI - angle of incidence (45 deg. or 60 deg.), AoD - angle of detection (90 deg. is mirror reflection from 45 deg. incidence, while 120 deg. is the same for 60 deg.), pol - angle of the polarizing prism (0 deg. or 90 deg., light intensity was lower for the 0 deg.).
Notes
Files
figure1.jpg
Files
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