Published February 25, 2023
| Version v1
Technical note
Open
Etching SiO2 without HF
Authors/Creators
- 1. Materials Science Factory, Instituto de Ciencia de Materiales de Madrid (ICMM), Consejo Superior de Investigaciones Científicas (CSIC)
- 2. Instituto de Sistemas Optoelectrónicos y Microtecnología, Universidad Politécnica de Madrid, Av. Complutense 30, 28040 Madrid, Spain
Description
In this technical note we share our experience etching SiO2 in SiO2/Si wafers without using hydrofluoric acid (HF). We have been using glass etching cream (in particular Armour Etch) which relaxes the safety when performing this etching process substantially.
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SiO2_etching_2023_02_25.pdf
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