There is a newer version of the record available.

Published January 18, 2023 | Version 1
Dataset Open

Electron beam damage to Topological Insulators

Authors/Creators

  • 1. Stanford University

Description

Transport data, point spread functions, and analysis code accompanying "Low-damage electron beam lithography for nanostructures on Bi2Te3-class topological insulator thin films."

Files

low-damage-EBL-data.zip

Files (2.6 MB)

Name Size Download all
md5:d3b1007725f619852698d1aa1c79543e
2.6 MB Preview Download