Plasma etching for fabrication of complex nanophotonic lasers from bonded InP semiconductor layers
Authors/Creators
- 1. IBM Research Europe - Zürich, Imperial College London
- 2. Imperial College London, IBM Research Europe - Zürich
- 3. IBM Research Europe - Zürich, Paul Scherrer Institut
- 4. IBM Research Europe - Zürich
- 5. Imperial College London
- 6. Paul Scherrer Institut, EPFL
Description
Integrating optically active III-V materials on silicon/insulator platforms is one potential path towards improving the energy efficiency and performance of modern computing. Here we demonstrate the applicability of direct wafer bonding combined with plasma etching to the fabrication of complex nanophotonic systems out of InP layers. We explore and optimise the plasma etching of InP, validating existing processes and developing improved ones. We explore the use of microdisk lasing as a way to evaluate fabrication fidelity, and demonstrate that we can create complex lasing systems of interest to us: coupled disk cavities and random network lasers.
This repository contains data used to generate figures in https://doi.org/10.1016/j.mne.2023.100196.
Files
fig3.csv
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Additional details
Related works
- Is supplement to
- Journal article: 10.1016/j.mne.2023.100196 (DOI)