Published June 21, 2022
| Version v1
Dataset
Open
Measured data of article in J. Vac. Sci. Technol. A 39, 052401 (2021); doi: 10.1116/6.0001126
Authors/Creators
- 1. Institute of Micro- and Nanoelectronic Systems, Karlsruhe Institute of Technology (KIT), 76187 Karlsruhe, Germany
- 2. Leibniz Institute of Photonic Technology (Leibniz IPHT), 07745 Jena, Germany
Description
The folder contains raw and fitted data of the in 2021 published article:
Wafer-level uniformity of atomic-layer-deposited niobium nitride thin films for quantum devices,
Authors: Emanuel Knehr, Mario Ziegler, Sven Linzen, Konstantin Ilin, Patrick Schanz, Jonathan Plentz, Marco Diegel, Heidemarie Schmidt, Evgeni Il’ichev, and Michael Siegel,
Journal: Journal of Vacuum Science & Technology A 39, 052401 (2021); https://doi.org/10.1116/6.0001126
The names of the 13 data files include the corresponding figure numbers of the published article.
Files
Fig_1a_Film_thickness_data_over_wafer_position.csv
Files
(9.0 MB)
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md5:173d6c785b7ea974c072597dbd892559
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md5:40c6f5922c483121c817d481e88dede9
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md5:a4bfe841d869275094b169900c00e827
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md5:2b10407a7373f217829699382f13d130
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md5:9eaca74e8225d246883f61ec4cbb4f31
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Additional details
Related works
- Is source of
- Journal article: 10.1116/6.0001126 (DOI)