Published March 18, 2022 | Version 1.0
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Dataset of D.-H. Chae et al., Meas. Sci.Technol 33 (2022) 065012, "Investigation of the stability of graphene devices for quantum resistance metrology at direct and alternating current"

  • 1. Korea Research Institute of Standards and Science (KRISS), Daejeon 34113, Republic of Korea
  • 2. Physikalisch-Technische Bundesanstalt (PTB), Bundesallee 100, 38116 Braunschweig, Germany
  • 3. Czech Metrology Institute (CMI), Okružní 31, 638 00 Brno, Czech Republic
  • 4. Istituto Nazionale di Ricerca Metrologica (INRIM), Strada delle Cacce, 91, 10135 Torino, Italy and Politecnico di Torino, Corso Duca degli Abruzzi 24, 10129 Torino, Italy
  • 5. Laboratoire National de Métrologie et d'Essais (LNE), 29 Avenue Roger Hennequin, 78197 Trappes, France

Description

Compilation of the datasets used to generate the figures in the following journal publication:

"Investigation of the stability of graphene devices for quantum resistance metrology at direct and alternating current"

by Dong-Hun Chae, Mattias Kruskopf, Jan Kucera, Jaesung Park, Ngoc Thanh Mai Tran, Dan Bee Kim, Klaus Pierz, Martin Götz, Yefei Yin, Pavel Svoboda, Petr Chrobok, François Couëdo and Félicien Schopfer,

Meas. Sci. Technol. 33 (2022) 065012,

DOI:10.1088/1361-6501/ac4a1a

Notes

This work was supported in part by the Joint Research Project GIQS (18SIB07). This project received funding from the European Metrology programme for Innovation and Research (EMPIR) co-financed by the Participating States and from the European Unions' Horizon 2020 research and innovation programme. Funder ID: 10.13039/100014132, Grant no: 18SIB07 GIQS.

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Is supplement to
Journal article: 10.1088/1361-6501/ac4a1a (DOI)