Anodization of Zircaloy-4 in 0.1 M KOH in Presence of Halide Ions

Department of Chemistry, University College of Science, Osmania University, Hyderabad-500 007

Manuscript received 27 May 1985, accepted 17 January 1986

The effect of halide ions on the kinetics of anodisation of zircaloy-4 in 0.1 M KOH have been studied at a constant current density of 4 mA cm^-2 and at room temperature. At higher concentrations of halide ions (≥ 0.1 M ), there is no film formation and deleterious effects are observed. However, there is film formation and the kinetics of film formation arc well studied at lower concentrations of halide ions. However, in the presence of iodide ions, there is a remarkable change in the kinetics of film formation.