Effect of solution concentration and deposition period on the properties of NiS2 thin films

Department of Chemistry, University Putra Malaysia, 43400 Serdang, Selangor, Malaysia

E-mail : anuar@fsas.upm.edu.my

Faculty of Engineering and Science, Universiti Tunku Abdul Rahman, 53300 Setapak, Kuala Lumpur, Malaysia

Manuscript received 21 November 2003, revised 7 February 2005, accepted 9 March 2005

Nickel sulfide thin films were deposited onto titanium substrates using triethanolamine as a complexing agent. The presence of the complexing agent was found to improve the lifetime of the deposition bath. The deposition conditions for obtaining good quality films such as solution concentrations and deposition period were optimized. The films were characterized using X-ray diffractometry and scanning electron microscopy. The photosensitivity of the films was studied using linear sweep voltammetry in the presence of sodium thiosulphate solution.