Published September 16, 2021 | Version v1
Dataset Restricted

Monitorization of chromium sputtering (PVD) process on plastic

Authors/Creators

  • 1. Tekniker

Description

The file collets the evolution of process parameters during the deposition of a chromium coating by magnetron  sputtering (PVD) on a polycarbonate substrate. The process was carried out at Tekniker research center. The monitorized process parameters are: time, gas flow, chamber pressure, substrate temperature, power, current and voltage of the evaporator.

Files

Restricted

The record is publicly accessible, but files are restricted. Log in to check if you have access.