Published July 9, 2021 | Version v1
Dataset Open

The effect of the graded bilayer design on the strain depth profiles and microstructure of CuW nano-multilayers

Authors/Creators

  • 1. Empa, Swiss Federal Laboratories for Materials Science and Technology, Laboratory for Joining Technologies and Corrosion, Überlandstrasse 129, Dübendorf CH-8600, Switzerland
  • 2. Instituto de Física, Facultad de Ingeniería, Universidad de la República, Herrera y Reissig 565, C.C. 30, Montevideo 11000, Uruguay
  • 3. Institute of Solid State Physics and Chernogolovka Scientific Center, Russian Academy of Sciences, Moscow district, Academician Ossipyan str., Chernogolovka 142432, Russian Federation

Description

In this document we share:

-the XRD in-plane scans acquired on Cu/W multilayers at different incidence angle,

-the in-situ stress curvature data acquired during multilayer growth,

-the in plane d-spacing derived at different incidence angle, used for the simulation of the strain gradient.

Files

data avilability_Mat&Des_The effect of the graded bilayer design on the strain depth profiles and microstructure of CuW nano-multilayers.zip

Files (4.2 MB)

Additional details

Funding

Swiss National Science Foundation
Fundamental understanding of internal stress in miscible and immiscible nanomultilayers 200021_192224