March 23, 2022 Journal article Open Access

Carlotti, Marco; Tricinci, Omar; Mattoli, Virgilio

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  <dc:creator>Carlotti, Marco</dc:creator>
  <dc:creator>Tricinci, Omar</dc:creator>
  <dc:creator>Mattoli, Virgilio</dc:creator>
  <dc:date>2022-03-23</dc:date>
  <dc:description>Research paper:

Marco Carlotti*, Omar Tricinci, Virgilio Mattoli*, Novel, High-Resolution, Subtractive Photoresist Formulations for 3D Direct Laser Writing based on Cyclic Ketene Acetals, Advanced Materials Technologies, 2101590, 2022  (In Press)</dc:description>
  <dc:identifier>https://zenodo.org/record/6396479</dc:identifier>
  <dc:identifier>10.1002/admt.202101590</dc:identifier>
  <dc:identifier>oai:zenodo.org:6396479</dc:identifier>
  <dc:relation>info:eu-repo/grantAgreement/EC/H2020/885881/</dc:relation>
  <dc:relation>info:eu-repo/grantAgreement/EC/H2020/899349/</dc:relation>
  <dc:relation>url:https://zenodo.org/communities/5dnanoprinting</dc:relation>
  <dc:rights>info:eu-repo/semantics/openAccess</dc:rights>
  <dc:rights>https://creativecommons.org/licenses/by/4.0/legalcode</dc:rights>
  <dc:source>Advanced Materials Technologies 2101590</dc:source>
  <dc:subject>Two photon lithography</dc:subject>
  <dc:subject>MDO</dc:subject>
  <dc:subject>Cyclic ketene acetal</dc:subject>
  <dc:subject>Erasable resist</dc:subject>
  <dc:subject>Photobase</dc:subject>
  <dc:subject>MEMS</dc:subject>
  <dc:title>Novel, High-Resolution, Subtractive Photoresist  Formulations for 3D Direct Laser Writing Based on Cyclic  Ketene Acetals</dc:title>
  <dc:type>info:eu-repo/semantics/article</dc:type>
  <dc:type>publication-article</dc:type>
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