Journal article Open Access

Novel, High-Resolution, Subtractive Photoresist Formulations for 3D Direct Laser Writing Based on Cyclic Ketene Acetals

Carlotti, Marco; Tricinci, Omar; Mattoli, Virgilio

BibTeX Export

@article{carlotti_marco_2022_6396479,
  author       = {Carlotti, Marco and
                  Tricinci, Omar and
                  Mattoli, Virgilio},
  title        = {{Novel, High-Resolution, Subtractive Photoresist 
                   Formulations for 3D Direct Laser Writing Based on
                   Cyclic  Ketene Acetals}},
  journal      = {Advanced Materials Technologies},
  year         = 2022,
  pages        = 2101590,
  month        = mar,
  doi          = {10.1002/admt.202101590},
  url          = {https://doi.org/10.1002/admt.202101590}
}
53
68
views
downloads
Views 53
Downloads 68
Data volume 326.5 MB
Unique views 37
Unique downloads 68
More info on how stats are collected.
Indexed in
Publication date:
March 23, 2022
DOI:
10.1002/admt.202101590
Keyword(s):
Two photon lithography MDO Cyclic ketene acetal Erasable resist Photobase MEMS
Published in:
Advanced Materials Technologies: pp. 2101590.
Grants:
European Commission:
  • MP3 - Multi-Potent Polymer Precursor approach for novel conjugated polymers (885881)
  • 5D NanoPrinting - Functional & Dynamic 3D Nano- MicroDevices by Direct Multi-Photon Lithography (899349)
Communities:
License (for files):
Creative Commons Attribution 4.0 International

Share

Cite as

Export