Journal article Open Access
Carlotti, Marco;
Tricinci, Omar;
Mattoli, Virgilio
<?xml version='1.0' encoding='utf-8'?> <resource xmlns:xsi="http://www.w3.org/2001/XMLSchema-instance" xmlns="http://datacite.org/schema/kernel-4" xsi:schemaLocation="http://datacite.org/schema/kernel-4 http://schema.datacite.org/meta/kernel-4.1/metadata.xsd"> <identifier identifierType="URL">https://zenodo.org/record/6396479</identifier> <creators> <creator> <creatorName>Carlotti, Marco</creatorName> <givenName>Marco</givenName> <familyName>Carlotti</familyName> <affiliation>Istituto Italiano di Tecnologia</affiliation> </creator> <creator> <creatorName>Tricinci, Omar</creatorName> <givenName>Omar</givenName> <familyName>Tricinci</familyName> <affiliation>Istituto Italiano di Tecnologia</affiliation> </creator> <creator> <creatorName>Mattoli, Virgilio</creatorName> <givenName>Virgilio</givenName> <familyName>Mattoli</familyName> <nameIdentifier nameIdentifierScheme="ORCID" schemeURI="http://orcid.org/">0000-0002-4715-8353</nameIdentifier> <affiliation>Istituto Italiano di Tecnologia</affiliation> </creator> </creators> <titles> <title>Novel, High-Resolution, Subtractive Photoresist Formulations for 3D Direct Laser Writing Based on Cyclic Ketene Acetals</title> </titles> <publisher>Zenodo</publisher> <publicationYear>2022</publicationYear> <subjects> <subject>Two photon lithography</subject> <subject>MDO</subject> <subject>Cyclic ketene acetal</subject> <subject>Erasable resist</subject> <subject>Photobase</subject> <subject>MEMS</subject> </subjects> <dates> <date dateType="Issued">2022-03-23</date> </dates> <resourceType resourceTypeGeneral="JournalArticle"/> <alternateIdentifiers> <alternateIdentifier alternateIdentifierType="url">https://zenodo.org/record/6396479</alternateIdentifier> </alternateIdentifiers> <relatedIdentifiers> <relatedIdentifier relatedIdentifierType="DOI" relationType="IsIdenticalTo">10.1002/admt.202101590</relatedIdentifier> <relatedIdentifier relatedIdentifierType="URL" relationType="IsPartOf">https://zenodo.org/communities/5dnanoprinting</relatedIdentifier> </relatedIdentifiers> <rightsList> <rights rightsURI="https://creativecommons.org/licenses/by/4.0/legalcode">Creative Commons Attribution 4.0 International</rights> <rights rightsURI="info:eu-repo/semantics/openAccess">Open Access</rights> </rightsList> <descriptions> <description descriptionType="Abstract"><p>Research paper:</p> <p>Marco Carlotti*, Omar Tricinci, Virgilio Mattoli*, Novel, High-Resolution, Subtractive Photoresist Formulations for 3D Direct Laser Writing based on Cyclic Ketene Acetals, Advanced Materials Technologies,&nbsp;2101590, 2022&nbsp; (In Press)</p></description> </descriptions> <fundingReferences> <fundingReference> <funderName>European Commission</funderName> <funderIdentifier funderIdentifierType="Crossref Funder ID">10.13039/100010661</funderIdentifier> <awardNumber awardURI="info:eu-repo/grantAgreement/EC/H2020/885881/">885881</awardNumber> <awardTitle>Multi-Potent Polymer Precursor approach for novel conjugated polymers</awardTitle> </fundingReference> <fundingReference> <funderName>European Commission</funderName> <funderIdentifier funderIdentifierType="Crossref Funder ID">10.13039/100010661</funderIdentifier> <awardNumber awardURI="info:eu-repo/grantAgreement/EC/H2020/899349/">899349</awardNumber> <awardTitle>Functional & Dynamic 3D Nano- MicroDevices by Direct Multi-Photon Lithography</awardTitle> </fundingReference> </fundingReferences> </resource>
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