Journal article Open Access

Novel, High-Resolution, Subtractive Photoresist Formulations for 3D Direct Laser Writing Based on Cyclic Ketene Acetals

Carlotti, Marco; Tricinci, Omar; Mattoli, Virgilio


DCAT Export

<?xml version='1.0' encoding='utf-8'?>
<rdf:RDF xmlns:rdf="http://www.w3.org/1999/02/22-rdf-syntax-ns#" xmlns:adms="http://www.w3.org/ns/adms#" xmlns:dc="http://purl.org/dc/elements/1.1/" xmlns:dct="http://purl.org/dc/terms/" xmlns:dctype="http://purl.org/dc/dcmitype/" xmlns:dcat="http://www.w3.org/ns/dcat#" xmlns:duv="http://www.w3.org/ns/duv#" xmlns:foaf="http://xmlns.com/foaf/0.1/" xmlns:frapo="http://purl.org/cerif/frapo/" xmlns:geo="http://www.w3.org/2003/01/geo/wgs84_pos#" xmlns:gsp="http://www.opengis.net/ont/geosparql#" xmlns:locn="http://www.w3.org/ns/locn#" xmlns:org="http://www.w3.org/ns/org#" xmlns:owl="http://www.w3.org/2002/07/owl#" xmlns:prov="http://www.w3.org/ns/prov#" xmlns:rdfs="http://www.w3.org/2000/01/rdf-schema#" xmlns:schema="http://schema.org/" xmlns:skos="http://www.w3.org/2004/02/skos/core#" xmlns:vcard="http://www.w3.org/2006/vcard/ns#" xmlns:wdrs="http://www.w3.org/2007/05/powder-s#">
  <rdf:Description rdf:about="https://zenodo.org/record/6396479">
    <dct:identifier rdf:datatype="http://www.w3.org/2001/XMLSchema#anyURI">https://zenodo.org/record/6396479</dct:identifier>
    <foaf:page rdf:resource="https://zenodo.org/record/6396479"/>
    <dct:creator>
      <rdf:Description>
        <rdf:type rdf:resource="http://xmlns.com/foaf/0.1/Agent"/>
        <foaf:name>Carlotti, Marco</foaf:name>
        <foaf:givenName>Marco</foaf:givenName>
        <foaf:familyName>Carlotti</foaf:familyName>
        <org:memberOf>
          <foaf:Organization>
            <foaf:name>Istituto Italiano di Tecnologia</foaf:name>
          </foaf:Organization>
        </org:memberOf>
      </rdf:Description>
    </dct:creator>
    <dct:creator>
      <rdf:Description>
        <rdf:type rdf:resource="http://xmlns.com/foaf/0.1/Agent"/>
        <foaf:name>Tricinci, Omar</foaf:name>
        <foaf:givenName>Omar</foaf:givenName>
        <foaf:familyName>Tricinci</foaf:familyName>
        <org:memberOf>
          <foaf:Organization>
            <foaf:name>Istituto Italiano di Tecnologia</foaf:name>
          </foaf:Organization>
        </org:memberOf>
      </rdf:Description>
    </dct:creator>
    <dct:creator>
      <rdf:Description rdf:about="http://orcid.org/0000-0002-4715-8353">
        <rdf:type rdf:resource="http://xmlns.com/foaf/0.1/Agent"/>
        <dct:identifier rdf:datatype="http://www.w3.org/2001/XMLSchema#string">0000-0002-4715-8353</dct:identifier>
        <foaf:name>Mattoli, Virgilio</foaf:name>
        <foaf:givenName>Virgilio</foaf:givenName>
        <foaf:familyName>Mattoli</foaf:familyName>
        <org:memberOf>
          <foaf:Organization>
            <foaf:name>Istituto Italiano di Tecnologia</foaf:name>
          </foaf:Organization>
        </org:memberOf>
      </rdf:Description>
    </dct:creator>
    <dct:title>Novel, High-Resolution, Subtractive Photoresist Formulations for 3D Direct Laser Writing Based on Cyclic Ketene Acetals</dct:title>
    <dct:publisher>
      <foaf:Agent>
        <foaf:name>Zenodo</foaf:name>
      </foaf:Agent>
    </dct:publisher>
    <dct:issued rdf:datatype="http://www.w3.org/2001/XMLSchema#gYear">2022</dct:issued>
    <dcat:keyword>Two photon lithography</dcat:keyword>
    <dcat:keyword>MDO</dcat:keyword>
    <dcat:keyword>Cyclic ketene acetal</dcat:keyword>
    <dcat:keyword>Erasable resist</dcat:keyword>
    <dcat:keyword>Photobase</dcat:keyword>
    <dcat:keyword>MEMS</dcat:keyword>
    <frapo:isFundedBy rdf:resource="info:eu-repo/grantAgreement/EC/H2020/885881/"/>
    <schema:funder>
      <foaf:Organization>
        <dct:identifier rdf:datatype="http://www.w3.org/2001/XMLSchema#string">10.13039/100010661</dct:identifier>
        <foaf:name>European Commission</foaf:name>
      </foaf:Organization>
    </schema:funder>
    <frapo:isFundedBy rdf:resource="info:eu-repo/grantAgreement/EC/H2020/899349/"/>
    <schema:funder>
      <foaf:Organization>
        <dct:identifier rdf:datatype="http://www.w3.org/2001/XMLSchema#string">10.13039/100010661</dct:identifier>
        <foaf:name>European Commission</foaf:name>
      </foaf:Organization>
    </schema:funder>
    <dct:issued rdf:datatype="http://www.w3.org/2001/XMLSchema#date">2022-03-23</dct:issued>
    <owl:sameAs rdf:resource="https://zenodo.org/record/6396479"/>
    <adms:identifier>
      <adms:Identifier>
        <skos:notation rdf:datatype="http://www.w3.org/2001/XMLSchema#anyURI">https://zenodo.org/record/6396479</skos:notation>
        <adms:schemeAgency>url</adms:schemeAgency>
      </adms:Identifier>
    </adms:identifier>
    <owl:sameAs rdf:resource="https://doi.org/10.1002/admt.202101590"/>
    <dct:isPartOf rdf:resource="https://zenodo.org/communities/5dnanoprinting"/>
    <dct:description>&lt;p&gt;Research paper:&lt;/p&gt; &lt;p&gt;Marco Carlotti*, Omar Tricinci, Virgilio Mattoli*, Novel, High-Resolution, Subtractive Photoresist Formulations for 3D Direct Laser Writing based on Cyclic Ketene Acetals, Advanced Materials Technologies,&amp;nbsp;2101590, 2022&amp;nbsp; (In Press)&lt;/p&gt;</dct:description>
    <dct:accessRights rdf:resource="http://publications.europa.eu/resource/authority/access-right/PUBLIC"/>
    <dct:accessRights>
      <dct:RightsStatement rdf:about="info:eu-repo/semantics/openAccess">
        <rdfs:label>Open Access</rdfs:label>
      </dct:RightsStatement>
    </dct:accessRights>
    <dct:license rdf:resource="https://creativecommons.org/licenses/by/4.0/legalcode"/>
    <dcat:distribution>
      <dcat:Distribution>
        <dcat:accessURL rdf:resource="https://doi.org/10.1002/admt.202101590"/>
        <dcat:byteSize>4801682</dcat:byteSize>
        <dcat:downloadURL rdf:resource="https://zenodo.org/record/6396479/files/Adv Materials Technologies - 2022 - Carlotti - Novel  High‐Resolution  Subtractive Photoresist Formulations for 3D Direct.pdf"/>
        <dcat:mediaType>application/pdf</dcat:mediaType>
      </dcat:Distribution>
    </dcat:distribution>
  </rdf:Description>
  <foaf:Project rdf:about="info:eu-repo/grantAgreement/EC/H2020/885881/">
    <dct:identifier rdf:datatype="http://www.w3.org/2001/XMLSchema#string">885881</dct:identifier>
    <dct:title>Multi-Potent Polymer Precursor approach for novel conjugated polymers</dct:title>
    <frapo:isAwardedBy>
      <foaf:Organization>
        <dct:identifier rdf:datatype="http://www.w3.org/2001/XMLSchema#string">10.13039/100010661</dct:identifier>
        <foaf:name>European Commission</foaf:name>
      </foaf:Organization>
    </frapo:isAwardedBy>
  </foaf:Project>
  <foaf:Project rdf:about="info:eu-repo/grantAgreement/EC/H2020/899349/">
    <dct:identifier rdf:datatype="http://www.w3.org/2001/XMLSchema#string">899349</dct:identifier>
    <dct:title>Functional &amp; Dynamic 3D Nano- MicroDevices by Direct Multi-Photon Lithography</dct:title>
    <frapo:isAwardedBy>
      <foaf:Organization>
        <dct:identifier rdf:datatype="http://www.w3.org/2001/XMLSchema#string">10.13039/100010661</dct:identifier>
        <foaf:name>European Commission</foaf:name>
      </foaf:Organization>
    </frapo:isAwardedBy>
  </foaf:Project>
</rdf:RDF>
53
68
views
downloads
Views 53
Downloads 68
Data volume 326.5 MB
Unique views 37
Unique downloads 68

Share

Cite as