Preprint Open Access

Tailoring the Phase in Nanoscale MoTe2 Grown by Barrier-Assisted Chemical Vapor Deposition

Christian Martella; Alessio Quadrelli; PinakaPani Tummala; Cristina Lenardi; Roberto Mantovan; Alessio Lamperti; Alessandro Molle


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  <identifier identifierType="URL">https://zenodo.org/record/4686903</identifier>
  <creators>
    <creator>
      <creatorName>Christian Martella</creatorName>
      <nameIdentifier nameIdentifierScheme="ORCID" schemeURI="http://orcid.org/">0000-0003-1811-165X</nameIdentifier>
      <affiliation>CNR-IMM, Unit of Agrate Brianza</affiliation>
    </creator>
    <creator>
      <creatorName>Alessio Quadrelli</creatorName>
      <affiliation>C.I.Ma.I.Na., Dipartimento di Fisica, Università degli Studi di Milano</affiliation>
    </creator>
    <creator>
      <creatorName>PinakaPani Tummala</creatorName>
      <affiliation>CNR-IMM, Unit of Agrate Brianza</affiliation>
    </creator>
    <creator>
      <creatorName>Cristina Lenardi</creatorName>
      <nameIdentifier nameIdentifierScheme="ORCID" schemeURI="http://orcid.org/">0000-0002-5522-6803</nameIdentifier>
      <affiliation>C.I.Ma.I.Na., Dipartimento di Fisica, Università degli Studi di Milano</affiliation>
    </creator>
    <creator>
      <creatorName>Roberto Mantovan</creatorName>
      <nameIdentifier nameIdentifierScheme="ORCID" schemeURI="http://orcid.org/">0000-0002-9353-4137</nameIdentifier>
      <affiliation>CNR-IMM, Unit of Agrate Brianza</affiliation>
    </creator>
    <creator>
      <creatorName>Alessio Lamperti</creatorName>
      <nameIdentifier nameIdentifierScheme="ORCID" schemeURI="http://orcid.org/">0000-0003-2061-2963</nameIdentifier>
      <affiliation>CNR-IMM, Unit of Agrate Brianza</affiliation>
    </creator>
    <creator>
      <creatorName>Alessandro Molle</creatorName>
      <nameIdentifier nameIdentifierScheme="ORCID" schemeURI="http://orcid.org/">0000-0002-3860-4120</nameIdentifier>
      <affiliation>CNR-IMM, Unit of Agrate Brianza</affiliation>
    </creator>
  </creators>
  <titles>
    <title>Tailoring the Phase in Nanoscale MoTe2 Grown by Barrier-Assisted Chemical Vapor Deposition</title>
  </titles>
  <publisher>Zenodo</publisher>
  <publicationYear>2021</publicationYear>
  <subjects>
    <subject>CVD</subject>
    <subject>MoTe2</subject>
  </subjects>
  <dates>
    <date dateType="Issued">2021-03-30</date>
  </dates>
  <resourceType resourceTypeGeneral="Preprint"/>
  <alternateIdentifiers>
    <alternateIdentifier alternateIdentifierType="url">https://zenodo.org/record/4686903</alternateIdentifier>
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  <relatedIdentifiers>
    <relatedIdentifier relatedIdentifierType="DOI" relationType="IsIdenticalTo">10.1021/acs.cgd.1c00130</relatedIdentifier>
  </relatedIdentifiers>
  <version>preprint</version>
  <rightsList>
    <rights rightsURI="https://creativecommons.org/licenses/by/4.0/legalcode">Creative Commons Attribution 4.0 International</rights>
    <rights rightsURI="info:eu-repo/semantics/openAccess">Open Access</rights>
  </rightsList>
  <descriptions>
    <description descriptionType="Abstract">&lt;p&gt;We employed chemical vapor deposition (CVD) from powder precursors aiming at large area growth of molybdenum ditellurides (MoTe2) thin films, with controlled allotropic 2H and 1T&amp;rsquo; phases. This major outcome entails tuning the parametric conditions of the precursor fluxes during the deposition. Using a physical barrier, we induce a concentration gradient of the Te precursor thus enabling the control of the flux fluid-dynamics and the formation of a Te-rich or Te-poor environment. As a consequence, the allotropic phase repartition in the films turns out to be determined by the barrier-induced Te concentration, as clearly evidenced by statistical Raman scattering investigations. The effect of the physical barrier is also reflected in the shape of the crystallite population and in their log-normal areal distribution pointing out to a homogenous nucleation mode of the MoTe2 crystals. Our approach shows the selective allotropic phase control in the barrier-assisted CVD deposition of MoTe2 by adjusting the kinetics of the chemical reaction rather than with the use of growth surfactants.&lt;/p&gt;</description>
    <description descriptionType="Other">The paper is now published at Journal of Crystal Growth and Design : https://pubs.acs.org/doi/10.1021/acs.cgd.1c00130</description>
  </descriptions>
  <fundingReferences>
    <fundingReference>
      <funderName>European Commission</funderName>
      <funderIdentifier funderIdentifierType="Crossref Funder ID">10.13039/501100000780</funderIdentifier>
      <awardNumber awardURI="info:eu-repo/grantAgreement/EC/H2020/824123/">824123</awardNumber>
      <awardTitle>Skyrmion-Topological insulator and Weyl semimetal technology</awardTitle>
    </fundingReference>
  </fundingReferences>
</resource>
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