Journal article Open Access

Reliability aspects of ferroelectric TiN/Hf0.5Zr0.5O2/Ge capacitors grown by plasma assisted atomic oxygen deposition

Zacharaki, Christina; Tsipas, Polychronis; Chaitoglou, Stefanos; Bégon-Lours, Laura; Halter, Mattia; Dimoulas, Athanasios


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@misc{zacharaki_christina_2020_4288888,
  author       = {Zacharaki, Christina and
                  Tsipas, Polychronis and
                  Chaitoglou, Stefanos and
                  Bégon-Lours, Laura and
                  Halter, Mattia and
                  Dimoulas, Athanasios},
  title        = {{Reliability aspects of ferroelectric 
                   TiN/Hf0.5Zr0.5O2/Ge capacitors grown by plasma
                   assisted atomic oxygen deposition}},
  month        = nov,
  year         = 2020,
  note         = {{Financial support is acknowledged from EU H2020 
                   ICT projects 3eFERRO-No. 780302 and
                   BeFerroSynaptic-No. 871737.}},
  publisher    = {Zenodo},
  doi          = {10.1063/5.0029657},
  url          = {https://doi.org/10.1063/5.0029657}
}
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