Journal article Open Access
Reliability aspects of ferroelectric TiN/Hf0.5Zr0.5O2/Ge capacitors grown by plasma assisted atomic oxygen deposition
Zacharaki, Christina;
Tsipas, Polychronis;
Chaitoglou, Stefanos;
Bégon-Lours, Laura;
Halter, Mattia;
Dimoulas, Athanasios
GeoJSON Export
{
"type": "FeatureCollection",
"features": []
}
63
264
views
downloads
| Views | 63 |
| Downloads | 264 |
| Data volume | 1.7 GB |
| Unique views | 54 |
| Unique downloads | 254 |
Indexed in
- Publication date:
- November 24, 2020
- DOI:
-
- Keyword(s):
- ferroelectric HfZrO MFS capacitors germanium plasma assisted atomic oxygen deposition reliability aspects
- Grants:
-
European Commission:
- 3eFERRO - Energy Efficient Embedded Non-volatile Memory Logic based on Ferroelectric Hf(Zr)O2 (780302)
- License (for files):
- Creative Commons Attribution 4.0 International