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ALD growth of ultra-thin Co layers on the topological insulator Sb2Te3 (data)

Emanuele Longo; Roberto Mantovan; Raimondo Cecchini; Michael D. Overbeek; Massimo Longo; Giovanna Trevisi; Laura Lazzarini; Grazia Tallarida; Marco Fanciulli; Charles H. Winter; Claudia Wiemer


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    "title": "ALD growth of ultra-thin Co layers on the topological insulator Sb2Te3 (data)", 
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      "atomic layer deposition", 
      "X-ray diffraction", 
      "Cobalt thin films", 
      "antimony telluride", 
      "metal organic chemical vapor deposition", 
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    "publication_date": "2020-02-13", 
    "creators": [
      {
        "affiliation": "CNR-IMM Unit of Agrate Brianza", 
        "name": "Emanuele Longo"
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        "affiliation": "CNR-IMM Unit of Agrate Brianza", 
        "name": "Roberto Mantovan"
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        "affiliation": "CNR-IMM Unit of Agrate Brianza", 
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        "affiliation": "Winter Laboratory, Wayne State University", 
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      {
        "affiliation": "CNR-IMM Unit of Agrate Brianza", 
        "name": "Massimo Longo"
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        "affiliation": "CNR-IMEM", 
        "name": "Giovanna Trevisi"
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        "affiliation": "CNR-IMEM", 
        "name": "Laura Lazzarini"
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      {
        "affiliation": "CNR-IMM Unit of Agrate Brianza", 
        "name": "Grazia Tallarida"
      }, 
      {
        "affiliation": "Universit\u00e0 degli Studi di Milano-Bicocca, Dipartimento di Scienze dei Materiali", 
        "name": "Marco Fanciulli"
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      {
        "affiliation": "Winter Laboratory, Wayne State University", 
        "name": "Charles H. Winter"
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        "affiliation": "CNR-IMM Unit of Agrate Brianza", 
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    "description": "<p>This dataset contains the raw data connected to all figures included in the &quot;<em>ALD growth of ultra-thin Co layers on the topological insulator Sb<sub>2</sub>Te<sub>3</sub></em>&quot; by E. Lango et at., Nano Research 13, 570 (2020):&nbsp;<a href=\"https://link.springer.com/article/10.1007/s12274-020-2657-4\">https://link.springer.com/article/10.1007/s12274-020-2657-4</a></p>"
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