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A simple way to control the filling degree of the SiO2/Si template pores with nickel

Yakimchuk D.; Bundyukova V.; Borgekov D.; Zdorovets M.; Kozlovskiy A.; Khubezhov S.A.; Magkoev T.T.; Bliev A.P.; Belonogov E.; Demyanov S.; Kaniukov E.

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@misc{yakimchuk_d_2019_3697199,
  author       = {Yakimchuk D. and
                  Bundyukova V. and
                  Borgekov D. and
                  Zdorovets M. and
                  Kozlovskiy A. and
                  Khubezhov S.A. and
                  Magkoev T.T. and
                  Bliev A.P. and
                  Belonogov E. and
                  Demyanov S. and
                  Kaniukov E.},
  title        = {{A simple way to control the filling degree of the 
                   SiO2/Si template pores with nickel}},
  month        = mar,
  year         = 2019,
  publisher    = {Zenodo},
  version      = {Author Accepted Manuscript},
  doi          = {10.5281/zenodo.3697199},
  url          = {https://doi.org/10.5281/zenodo.3697199}
}
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Publication date:
March 6, 2019
DOI:
10.5281/zenodo.3697199

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10.5281/zenodo.3697199

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Keyword(s):
Ion-track technology SiO2/Si template template synthesis electrodeposition nickel nanostructures
Grants:
European Commission:
  • SPINMULTIFILM - Physical principles of the creation of novel SPINtronic materials on the base of MULTIlayered metal-oxide FILMs for magnetic sensors and MRAM (778308)
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Creative Commons Attribution 4.0 International

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Version Author Accepted Manuscript 10.5281/zenodo.3697199 Mar 6, 2019
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