Journal article Open Access

A simple way to control the filling degree of the SiO2/Si template pores with nickel

Yakimchuk D.; Bundyukova V.; Borgekov D.; Zdorovets M.; Kozlovskiy A.; Khubezhov S.A.; Magkoev T.T.; Bliev A.P.; Belonogov E.; Demyanov S.; Kaniukov E.

DCAT Export

<?xml version='1.0' encoding='utf-8'?>
<rdf:RDF xmlns:rdf="http://www.w3.org/1999/02/22-rdf-syntax-ns#" xmlns:adms="http://www.w3.org/ns/adms#" xmlns:dc="http://purl.org/dc/elements/1.1/" xmlns:dct="http://purl.org/dc/terms/" xmlns:dctype="http://purl.org/dc/dcmitype/" xmlns:dcat="http://www.w3.org/ns/dcat#" xmlns:duv="http://www.w3.org/ns/duv#" xmlns:foaf="http://xmlns.com/foaf/0.1/" xmlns:frapo="http://purl.org/cerif/frapo/" xmlns:geo="http://www.w3.org/2003/01/geo/wgs84_pos#" xmlns:gsp="http://www.opengis.net/ont/geosparql#" xmlns:locn="http://www.w3.org/ns/locn#" xmlns:org="http://www.w3.org/ns/org#" xmlns:owl="http://www.w3.org/2002/07/owl#" xmlns:prov="http://www.w3.org/ns/prov#" xmlns:rdfs="http://www.w3.org/2000/01/rdf-schema#" xmlns:schema="http://schema.org/" xmlns:skos="http://www.w3.org/2004/02/skos/core#" xmlns:vcard="http://www.w3.org/2006/vcard/ns#" xmlns:wdrs="http://www.w3.org/2007/05/powder-s#">
  <rdf:Description rdf:about="https://doi.org/10.5281/zenodo.3697199">
    <dct:identifier rdf:datatype="http://www.w3.org/2001/XMLSchema#anyURI">https://doi.org/10.5281/zenodo.3697199</dct:identifier>
    <foaf:page rdf:resource="https://doi.org/10.5281/zenodo.3697199"/>
    <dct:creator>
      <rdf:Description>
        <rdf:type rdf:resource="http://xmlns.com/foaf/0.1/Agent"/>
        <foaf:name>Yakimchuk D.</foaf:name>
        <org:memberOf>
          <foaf:Organization>
            <foaf:name>SSPA "Scientific-Practical Materials Research Centre of NAS of Belarus, 19, P.Brovka Str. 220072, Minsk, Republic of Belarus</foaf:name>
          </foaf:Organization>
        </org:memberOf>
      </rdf:Description>
    </dct:creator>
    <dct:creator>
      <rdf:Description>
        <rdf:type rdf:resource="http://xmlns.com/foaf/0.1/Agent"/>
        <foaf:name>Bundyukova V.</foaf:name>
        <org:memberOf>
          <foaf:Organization>
            <foaf:name>SSPA "Scientific-Practical Materials Research Centre of NAS of Belarus, 19, P.Brovka Str. 220072, Minsk, Republic of Belarus</foaf:name>
          </foaf:Organization>
        </org:memberOf>
      </rdf:Description>
    </dct:creator>
    <dct:creator>
      <rdf:Description>
        <rdf:type rdf:resource="http://xmlns.com/foaf/0.1/Agent"/>
        <foaf:name>Borgekov D.</foaf:name>
        <org:memberOf>
          <foaf:Organization>
            <foaf:name>L.N. Gumilyov Eurasian National University, 2, Satpayev Str. 010008, Astana, Kazakhstan &amp; The Institute of Nuclear Physics of Republic of Kazakhstan, 1, Ibragimov St. 050032, Astana, Kazakhstan</foaf:name>
          </foaf:Organization>
        </org:memberOf>
      </rdf:Description>
    </dct:creator>
    <dct:creator>
      <rdf:Description>
        <rdf:type rdf:resource="http://xmlns.com/foaf/0.1/Agent"/>
        <foaf:name>Zdorovets M.</foaf:name>
        <org:memberOf>
          <foaf:Organization>
            <foaf:name>L.N. Gumilyov Eurasian National University, 2, Satpayev Str. 010008, Astana, Kazakhstan &amp; The Institute of Nuclear Physics of Republic of Kazakhstan, 1, Ibragimov St. 050032, Astana, Kazakhstan &amp; Ural Federal University named after the First President of Russia B.N. Yeltsin, 19, Mira St. 620002, Yekaterinburg, Russia</foaf:name>
          </foaf:Organization>
        </org:memberOf>
      </rdf:Description>
    </dct:creator>
    <dct:creator>
      <rdf:Description>
        <rdf:type rdf:resource="http://xmlns.com/foaf/0.1/Agent"/>
        <foaf:name>Kozlovskiy A.</foaf:name>
        <org:memberOf>
          <foaf:Organization>
            <foaf:name>L.N. Gumilyov Eurasian National University, 2, Satpayev Str. 010008, Astana, Kazakhstan &amp; The Institute of Nuclear Physics of Republic of Kazakhstan, 1, Ibragimov St. 050032, Astana, Kazakhstan</foaf:name>
          </foaf:Organization>
        </org:memberOf>
      </rdf:Description>
    </dct:creator>
    <dct:creator>
      <rdf:Description>
        <rdf:type rdf:resource="http://xmlns.com/foaf/0.1/Agent"/>
        <foaf:name>Khubezhov S.A.</foaf:name>
        <org:memberOf>
          <foaf:Organization>
            <foaf:name>North Ossetian State University, 44-46, Vatutina str. 362000,Vladikavkaz, Russian Federation</foaf:name>
          </foaf:Organization>
        </org:memberOf>
      </rdf:Description>
    </dct:creator>
    <dct:creator>
      <rdf:Description>
        <rdf:type rdf:resource="http://xmlns.com/foaf/0.1/Agent"/>
        <foaf:name>Magkoev T.T.</foaf:name>
        <org:memberOf>
          <foaf:Organization>
            <foaf:name>North Ossetian State University, 44-46, Vatutina str. 362000,Vladikavkaz, Russian Federation</foaf:name>
          </foaf:Organization>
        </org:memberOf>
      </rdf:Description>
    </dct:creator>
    <dct:creator>
      <rdf:Description>
        <rdf:type rdf:resource="http://xmlns.com/foaf/0.1/Agent"/>
        <foaf:name>Bliev A.P.</foaf:name>
        <org:memberOf>
          <foaf:Organization>
            <foaf:name>North Ossetian State University, 44-46, Vatutina str. 362000,Vladikavkaz, Russian Federation</foaf:name>
          </foaf:Organization>
        </org:memberOf>
      </rdf:Description>
    </dct:creator>
    <dct:creator>
      <rdf:Description>
        <rdf:type rdf:resource="http://xmlns.com/foaf/0.1/Agent"/>
        <foaf:name>Belonogov E.</foaf:name>
        <org:memberOf>
          <foaf:Organization>
            <foaf:name>Voronezh State Technical University, 14, Moskovski ave., 394026, Voronezh, Russian Federation &amp; Voronezh State University, 1, University square, 394006, Voronezh, Russian Federation</foaf:name>
          </foaf:Organization>
        </org:memberOf>
      </rdf:Description>
    </dct:creator>
    <dct:creator>
      <rdf:Description>
        <rdf:type rdf:resource="http://xmlns.com/foaf/0.1/Agent"/>
        <foaf:name>Demyanov S.</foaf:name>
        <org:memberOf>
          <foaf:Organization>
            <foaf:name>SSPA "Scientific-Practical Materials Research Centre of NAS of Belarus, 19, P.Brovka Str. 220072, Minsk, Republic of Belarus</foaf:name>
          </foaf:Organization>
        </org:memberOf>
      </rdf:Description>
    </dct:creator>
    <dct:creator>
      <rdf:Description>
        <rdf:type rdf:resource="http://xmlns.com/foaf/0.1/Agent"/>
        <foaf:name>Kaniukov E.</foaf:name>
        <org:memberOf>
          <foaf:Organization>
            <foaf:name>SSPA "Scientific-Practical Materials Research Centre of NAS of Belarus, 19, P.Brovka Str. 220072, Minsk, Republic of Belarus</foaf:name>
          </foaf:Organization>
        </org:memberOf>
      </rdf:Description>
    </dct:creator>
    <dct:title>A simple way to control the filling degree of the SiO2/Si template pores with nickel</dct:title>
    <dct:publisher>
      <foaf:Agent>
        <foaf:name>Zenodo</foaf:name>
      </foaf:Agent>
    </dct:publisher>
    <dct:issued rdf:datatype="http://www.w3.org/2001/XMLSchema#gYear">2019</dct:issued>
    <dcat:keyword>Ion-track technology</dcat:keyword>
    <dcat:keyword>SiO2/Si template</dcat:keyword>
    <dcat:keyword>template synthesis</dcat:keyword>
    <dcat:keyword>electrodeposition</dcat:keyword>
    <dcat:keyword>nickel nanostructures</dcat:keyword>
    <frapo:isFundedBy rdf:resource="info:eu-repo/grantAgreement/EC/H2020/778308/"/>
    <schema:funder>
      <foaf:Organization>
        <dct:identifier rdf:datatype="http://www.w3.org/2001/XMLSchema#string">10.13039/100010661</dct:identifier>
        <foaf:name>European Commission</foaf:name>
      </foaf:Organization>
    </schema:funder>
    <dct:issued rdf:datatype="http://www.w3.org/2001/XMLSchema#date">2019-03-06</dct:issued>
    <dct:language rdf:resource="http://publications.europa.eu/resource/authority/language/ENG"/>
    <owl:sameAs rdf:resource="https://zenodo.org/record/3697199"/>
    <adms:identifier>
      <adms:Identifier>
        <skos:notation rdf:datatype="http://www.w3.org/2001/XMLSchema#anyURI">https://zenodo.org/record/3697199</skos:notation>
        <adms:schemeAgency>url</adms:schemeAgency>
      </adms:Identifier>
    </adms:identifier>
    <dct:hasVersion rdf:resource="https://doi.org/10.1016/j.matpr.2018.12.085"/>
    <dct:isVersionOf rdf:resource="https://doi.org/10.5281/zenodo.3697198"/>
    <owl:versionInfo>Author Accepted Manuscript</owl:versionInfo>
    <dct:description>&lt;p&gt;The paper demonstrates a simple way to control the filling degree of the pores of a silicon oxide template on silicon substrate with nickel. SiO2/Si template was formed using the swift heavy ion tracks technology, which includes irradiation with high energy ions and chemical transformation of the obtained latent tracks into the pores. The preparation of SiO2(Ni)/Si nanostructures with different filling degree of pores in SiO2 with nickel was performed using the electrodeposition method by changing the duration of the process. A study and analysis of the morphology of SiO2(Ni)/Si nanostructures using scanning electron and atomic force microscopy was carried out to determine the nature of pore filling by metal.&lt;/p&gt;</dct:description>
    <dct:accessRights rdf:resource="http://publications.europa.eu/resource/authority/access-right/PUBLIC"/>
    <dct:accessRights>
      <dct:RightsStatement rdf:about="info:eu-repo/semantics/openAccess">
        <rdfs:label>Open Access</rdfs:label>
      </dct:RightsStatement>
    </dct:accessRights>
    <dct:license rdf:resource="https://creativecommons.org/licenses/by/4.0/legalcode"/>
    <dcat:distribution>
      <dcat:Distribution>
        <dcat:accessURL rdf:resource="https://doi.org/10.5281/zenodo.3697199"/>
        <dcat:byteSize>991555</dcat:byteSize>
        <dcat:downloadURL rdf:resource="https://zenodo.org/record/3697199/files/Yakimchuk et al (AAM) - Materials Today Proceedings 7 (2019) 860–865.pdf"/>
        <dcat:mediaType>application/pdf</dcat:mediaType>
      </dcat:Distribution>
    </dcat:distribution>
  </rdf:Description>
  <foaf:Project rdf:about="info:eu-repo/grantAgreement/EC/H2020/778308/">
    <dct:identifier rdf:datatype="http://www.w3.org/2001/XMLSchema#string">778308</dct:identifier>
    <dct:title>Physical principles of the creation of novel SPINtronic materials on the base of MULTIlayered metal-oxide FILMs for magnetic sensors and MRAM</dct:title>
    <frapo:isAwardedBy>
      <foaf:Organization>
        <dct:identifier rdf:datatype="http://www.w3.org/2001/XMLSchema#string">10.13039/100010661</dct:identifier>
        <foaf:name>European Commission</foaf:name>
      </foaf:Organization>
    </frapo:isAwardedBy>
  </foaf:Project>
</rdf:RDF>
33
34
views
downloads
All versions This version
Views 3333
Downloads 3434
Data volume 33.7 MB33.7 MB
Unique views 2929
Unique downloads 3333
More info on how stats are collected.
Indexed in
Publication date:
March 6, 2019
DOI:
10.5281/zenodo.3697199

Zenodo DOI Badge

DOI 

10.5281/zenodo.3697199

Markdown 

[![DOI](https://zenodo.org/badge/DOI/10.5281/zenodo.3697199.svg)](https://doi.org/10.5281/zenodo.3697199)

reStructedText 

.. image:: https://zenodo.org/badge/DOI/10.5281/zenodo.3697199.svg
   :target: https://doi.org/10.5281/zenodo.3697199

HTML 

<a href="https://doi.org/10.5281/zenodo.3697199"><img src="https://zenodo.org/badge/DOI/10.5281/zenodo.3697199.svg" alt="DOI"></a>

Image URL 

https://zenodo.org/badge/DOI/10.5281/zenodo.3697199.svg

Target URL 

https://doi.org/10.5281/zenodo.3697199

Keyword(s):
Ion-track technology SiO2/Si template template synthesis electrodeposition nickel nanostructures
Grants:
European Commission:
  • SPINMULTIFILM - Physical principles of the creation of novel SPINtronic materials on the base of MULTIlayered metal-oxide FILMs for magnetic sensors and MRAM (778308)
Related identifiers:
New versions
License (for files):
Creative Commons Attribution 4.0 International

Versions

Version Author Accepted Manuscript 10.5281/zenodo.3697199 Mar 6, 2019
Cite all versions? You can cite all versions by using the DOI 10.5281/zenodo.3697198. This DOI represents all versions, and will always resolve to the latest one. Read more.

Share

Cite as

Export