Journal article Open Access

Origin of ferroelectric phase in undoped HfO2 films deposited by sputtering

T. Mittmann; M. Materano; P. D. Lomenzo; M. H. Park; I. Stolichnov; M. Cavalieri; C. Zhou; J. L. Jones; T. Szyjka; M. Müller; A. Kersch; T. Mikolajick; U. Schroeder


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