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Deposition of amorphous carbon at different energies modeled with GAP

Caro, Miguel A.


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    <subfield code="a">&lt;p&gt;These videos show the simulated deposition, one atom at a time, of amorphous carbon (a-C) films. The system is equilibrated to 300 K after each impact and before the next deposition event. Different deposition energies are simulated, from 1 eV to 100 eV. The atoms are deposited onto a preexisting diamond substrate, shown in the 60 eV video; after 2500 depositions at 60 eV, the generated a-C film is used as template to deposit all the other films. The interatomic interactions are modeled with the a-C GAP of Deringer and Cs&amp;aacute;nyi [Phys. Rev. B &lt;strong&gt;95&lt;/strong&gt;, 094203 (2017)] interfaced through LAMMPS [http://lammps.sandia.gov]. The visualization is carried out with VMD [http://www.ks.uiuc.edu/Research/vmd] using Axel Kohlmeyer&amp;#39;s TopoTools [DOI:&amp;nbsp;10.5281/zenodo.545655]. For further information, refer to Phys. Rev. Lett.&amp;nbsp;&lt;strong&gt;120&lt;/strong&gt;, 166101 (2018) and Phys.&amp;nbsp;Rev.&amp;nbsp;B &lt;strong&gt;102&lt;/strong&gt;,&amp;nbsp;174201 (2020).&amp;nbsp;Funding from the Academy of Finland (grants 310574 and 285526) and computational resources from CSC [http://www.csc.fi] are acknowledged.&lt;/p&gt;</subfield>
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